4.8 Article

Stimulated Emission Depletion Lithography with Mercapto-Functional Polymers

期刊

ACS NANO
卷 10, 期 2, 页码 1954-1959

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acsnano.5b05863

关键词

STED lithography; functional polymers; zirconium oxo cluster polymerization; thiol polymers

资金

  1. Austrian Science Fund (FWF) [P 26461-N20 (3DS-PNA), P22915, P 26337-B21]
  2. European Research Council (ERC) [257158 Active NP]
  3. Austrian Science Fund (FWF) [P26337] Funding Source: Austrian Science Fund (FWF)

向作者/读者索取更多资源

Surface reactive nanostructures were fabricated using stimulated emission depletion (STED) lithography. The functionalization of the nanostructures was realized by copolymerization of a bifunctional metal oxo cluster in the presence of a triacrylate monomer. Ligands of the cluster surface cross-link to the monomer during the lithographic process, whereas unreacted mercapto functionalized ligands are transferred to the polymer and remain reactive after polymer formation of the surface of the nanostructure. The depletion efficiency in dependence of the cluster loading was investigated and full depletion of the STED effect was observed with a cluster loading exceeding 4 wt %. A feature size by lambda/11 was achieved by using a donut-shaped depletion beam. The reactivity of the mercapto groups on the surface of the nanostructure was tested by incubation with mercapto-reactive fluorophores.

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