4.8 Article

Optoelectronic Properties of Few-Layer MoS2 FET Gated by Ferroelectric Relaxor Polymer

期刊

ACS APPLIED MATERIALS & INTERFACES
卷 8, 期 47, 页码 32083-32088

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acsami.6b10206

关键词

MoS2; Ferroelectric relaxor; P(VDF-TrFE-CFE); high-kappa; photodetectors

资金

  1. Major State Basic Research Development Program [2013CB922302, 2016YFA0203900]
  2. Natural Science Foundation of China [11374320, 61404147, 61574151, 11322441, 61574152]
  3. Natural Science Foundation of Shanghai [13JC1406000, 14JC1406400]
  4. Key Research Project of Frontier Sciences of CAS [QYZDB-SSW-JSC016, QYZDB-SSW-JSC031]

向作者/读者索取更多资源

Recently, new devices combining two-dimensional (2D) materials with ferroelectrics, have been a new hotspot for promising applications in electronics and optoelectronics. Here, we design a new type of FET using the 2D MoS2 and poly(vinylidene fluoride-trifluoroethylene-chlorofloroethylene) terpolymer ferroelectric relaxor. The devices exhibit excellent performance including a large on/off ratio) and an insignificant leakage current. Moreover, the hysteresis characteristics are effectively modulated for its ferroelectric properties at low temperature. Additionally, a broad range photoresponse (visible to 1.55 mu m) and a high sensitivity (>300 A/W, lambda = 450 nm) are achieved. These results indicate that ferroelectric relaxor can be applied into the high-performance 2D optoelectronic devices.

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