4.8 Article

Thermally Stable Siloxane Hybrid Matrix with Low Dielectric Loss for Copper-Clad Laminates for High-Frequency Applications

期刊

ACS APPLIED MATERIALS & INTERFACES
卷 8, 期 13, 页码 8335-8340

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acsami.6b01497

关键词

copper clad laminates; low dielectric loss; low dielectric constant; siloxane hybrid material; thermal stability

资金

  1. KOLON Industries Inc
  2. National Research Foundation of Korea (NRF) grant - Korea government (MSIP) [NRF-2015R1A2A1A15056057]
  3. Korea Evaluation Institute of Industrial Technology [10051337]

向作者/读者索取更多资源

We report vinyl-phenyl siloxane hybrid material (VPH) that can be used as a matrix for copper-clad laminates (CCLs) for high frequency applications. The CCLs, with a VPH matrix fabricated via radical polymerization of resin blend consisting of sol gel-derived linear vinyl oligosiloxane and bulky siloxane monomer, phenyltris(trimethylsiloxy)silane, achieve low dielectric constant (Dk) and dissipation factor (Df). The CCLs with the VPH matrix exhibit excellent dielectric performance (Dk = 2.75, Df = 0.0015 at 1 GHz) with stability in wide frequency range (1 MHz to 10 GHz) and at high temperature (up to 275 degrees C). Also, the VPH shows good flame resistance without any additives. These results suggest the potential of the VPH for use in highspeed IC boards.

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