4.8 Article

Effect of Polymer Gate Dielectrics on Charge Transport in Carbon Nanotube Network Transistors: Low-k Insulator for Favorable Active Interface

期刊

ACS APPLIED MATERIALS & INTERFACES
卷 8, 期 47, 页码 32421-32431

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acsami.6b06882

关键词

carbon nanotube field-effect transistors; gate dielectrics; polymer dielectrics; conjugated polymer wrapped single wall carbon nanotube; charge transport

资金

  1. National Research Foundation of Korea (NRF) - Korean Government (MSIP) [NRF-2014R1A2A2A01007159, NRF-2015R1A2A1A10054466]
  2. Center for Advanced Soft Electronics - Ministry of Science, ICT & Future Planning [2013M3A6A5073183]

向作者/读者索取更多资源

Charge transport in carbon nanotube network transistors strongly depends on the properties of the gate dielectric that is in direct contact with the semiconducting carbon nanotubes. In this work, we investigate the dielectric effects on charge transport in polymer-sorted semiconducting single-walled carbon nanotube field-effect transistors (s-SWNT-FETs) by using three different polymer insulators: A low-permittivity (epsilon(r)) fluoropolymer (CYTOP, epsilon(r) = 1.8), poly(methyl methacrylate) (PMMA, epsilon(r) = 3.3), and a high-epsilon(r) ferroelectric relaxor [P(VDF-TrFE-CTFE), epsilon(r) = 14.2]. The s-SWNT-FETs with polymer dielectrics show typical ambipolar charge transport with high ON/OFF ratios (up to similar to 10(5)) and mobilities (hole mobility up to 6.77 cm(2) V-1 s(-1) for CYTOP). The s-SWNT-FET with the lowest-k dielectric, CYTOP, exhibits the highest mobility owing to formation of a favorable interface for charge transport, which is confirmed by the lowest activation energies, evaluated by the fluctuation-induced tunneling model (FIT) and the traditional Arrhenius model (E-aFIT = 60.2 meV and E-aArr = 10 meV). The operational stability of the devices showed a good agreement with the activation energies trend (drain current decay similar to 14%, threshold voltage shift similar to 0.26 V in p-type regime of CYTOP devices). The poor performance in high-epsilon(r) devices is accounted for by a large energetic disorder caused by the randomly oriented dipoles in high-k dielectrics. In conclusion, the low-k dielectric forms a favorable interface with s-SWNTs for efficient charge transport in s-SWNT-FETs.

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