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Graphene synthesized in atmospheric plasmas-A review

期刊

JOURNAL OF MATERIALS RESEARCH
卷 34, 期 1, 页码 214-230

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SPRINGER HEIDELBERG
DOI: 10.1557/jmr.2018.470

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C; ethanol; plasma-enhanced CVD (PECVD) (chemical reaction)

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This article reviews the state of the art in the gas-phase synthesis of graphene in atmospheric plasmas. The substrate-free process involves the delivery of a carbon-containing precursor into a microwave-generated Ar plasma. Factors that influence the synthesis of graphene include precursor composition, reactor design, and the flow rates of gases. These factors have elucidated the mechanisms of graphene formation in atmospheric plasmas. Gas phase-synthesized graphene is pure and highly ordered and possesses unique features that make the material useful in applications such as catalysis, energy storage, lubrication, and the transmission electron microscopy imaging of nanomaterials. However, the main challenge in the synthesis process is the low rate of graphene production. This article anticipates future research aimed at overcoming this challenge and compares the atmospheric plasma method with contemporary graphene production techniques.

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