期刊
APPLIED SURFACE SCIENCE
卷 463, 期 -, 页码 141-149出版社
ELSEVIER
DOI: 10.1016/j.apsusc.2018.08.154
关键词
Carbon nitride thin film; Plasma focus device; Graphite substrate; Deposition angle; Raman spectroscopy; Scanning electron microscopy; Fourier transform infrared spectroscopy; XRD analysis
Amorphous carbon nitride (a-CNx) thin films were deposited on graphite substrate at different angular positions using a low energy (up to 4.9 kJ) Mather-type plasma focus device. The deposition processes were carried out during 20 focus shots at optimum nitrogen gas pressure of 0.4 mbar. The formation of amorphous carbon nitride was confirmed by Raman Spectroscopy, SEM, EDX, FTIR, and XRD analyses. The intensity ratio of D and G peaks (ID/IG) recorded by Raman Spectroscopy showed two distinct trends at various angular positions. The sample deposited at 30 degrees had the highest I-D/I-G ratio and correspondingly the highest sp(3) CHx content in FTIR spectrum. Samples with lower I-D/I-G ratio appeared with smaller grain size and more smooth surfaces in SEM images. The highest C=N intensities in FTIR spectrum belonged to those samples deposited at 30 and 75 degrees angular positions.
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