期刊
ACS APPLIED MATERIALS & INTERFACES
卷 10, 期 47, 页码 40958-40965出版社
AMER CHEMICAL SOC
DOI: 10.1021/acsami.8b17194
关键词
copper nanoparticles; localized surface plasmon resonance; atomic layer deposition; hot electrons; photodetectors
资金
- Erasmus Mundus Ph.D. fellowship doctoral program Doc-MASE [2015-03]
- Universite franco-allemande (UFA) PhD track German/French Graduate School in Materials Science and Engineering [PhD02-14]
- Carl Tryggers Foundation [CTS17:24, CTS16:13]
- Knut and Alice Wallenberg Foundation
- Kempe Foundations [SMK-2546]
Plasmonic Cu nanoparticles (NP) were successfully deposited on ZnO substrates by atomic layer deposition (ALD) owing to the Volmer Weber island growth mode. An evolution from Cu NP to continuous Cu films was observed with an increasing number of ALD cycles. Real and imaginary parts of the NP dielectric functions, determined by spectroscopic ellipsometry using an effective medium approach, evidence a localized surface plasmon resonance that can be tuned between the visible and near-infrared ranges by controlling the interparticle spacing and size of the NP. The resulting Cu NP/ZnO device shows an enhanced photoresponse under white light illumination with good responsivity values, fast response times, and stability under dark/light cycles. The significant photocurrent detected for this device is related to the hot-electron generation at the NP surface and injection into the conduction band of ZnO. The possibility of tuning the plasmon resonance together with the photoresponsivity of the device is promising in many applications related to photodetection, photonics, and photovoltaics.
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