期刊
ACS APPLIED MATERIALS & INTERFACES
卷 11, 期 1, 页码 1335-1343出版社
AMER CHEMICAL SOC
DOI: 10.1021/acsami.8b14806
关键词
thermoresponsive thin film; copolymer; atmospheric plasma CVD; conventional polymerization; pulsed discharge
资金
- Luxembourg National Research Fund (fnr.lu) through the NANOPOLYPULSE project [C14/MS/8345246]
The growth of thermoresponsive layers with the atmospheric pressure plasma-initiated chemical vapor deposition (AP-PiCVD) process is reported for the first time. N-vinyl caprolactam (NVCL) was successfully homopolymerized and copolymerized with ethylene glycol dimethacrylate (EGDMA), yielding water-soluble and water-stable thermoresponsive thin films, respectively. Strong chemical retention and high thermoresponsivity were achieved, highlighting the ability of AP-PiCVD to grow functional conventional homopolymers and copolymers.
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