期刊
IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY
卷 6, 期 1, 页码 825-829出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JEDS.2018.2858294
关键词
Free standing gallium nitride (GaN); power p-n diode; high breakdown voltage
资金
- Institute for Radiological Research Center, CGU [CIRPD2F0021]
- National Key Research and Development Plan [2017YFB0404100]
- National Natural Science Foundation of China [61504083]
- Public Welfare Capacity Building in Guangdong Province [2015A010103016]
- Science and Technology Foundation of Shenzhen [JCYJ 20160226192033020]
- Natural Science Foundation of SZU [000062]
This paper reports vertical Gallium nitride (GaN) PN diodes on free-standing GaN wafer using a complementary metal-oxide-semiconductor compatible contact materials. Static and switching current-voltage measurements have been carried out to evaluate the fabricated vertical GaN PN diodes. The vertical GaN PN diode in this paper shows turn-on voltage Von of similar to 3.3-3.4 V, on/off current ratio of similar to 2.7 x 10(7), and ideal factor n of similar to 2.1. The reverse recovery time Trr is 21.2 ns and 23.2 ns, respectively, under a testing temperature of 300 K and 500 K. With an on-state resistance Ron of 3.9 m Omega.cm(2) and a breakdown voltage V-BR of 2.4 kV, this device achieves a power device figure-of-merit V-BR(2)/R-on of 1.5x 10(9) V-2 Omega(-1)cm(-2).
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