相关参考文献
注意：仅列出部分参考文献，下载原文获取全部文献信息。rf plasma system as an atomic oxygen exposure facility
Z. Shpilman et al.
REVIEW OF SCIENTIFIC INSTRUMENTS (2008)
Recommended practice for process sampling for partial pressure analysis
James E. Blessing et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2007)
Attenuation of hydrogen radicals traveling under flowing gas conditions through tubes of different materials
R. K. Grubbs et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2006)
Radio-frequency discharge cleaning of silicon-capped Mo/Si multilayer extreme ultraviolet optics
S Graham et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2002)
Cleaning of contaminated XUV-optics at BESSY II
F Eggenstein et al.
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT (2001)
分享论文
