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Eric Bersch et al.
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Self-consistent GW calculations for semiconductors and insulators
M. Shishkin et al.
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Study of electrical and microstructure properties of high dielectric hafnium oxide thin film for MOS devices
R. K. Nahar et al.
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Hybrid functionals applied to rare-earth oxides: The example of ceria
Juarez L. F. Da Silva et al.
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USPEX - Evolutionary crystal structure prediction
Colin W. Glass et al.
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Implementation and performance of the frequency-dependent GW method within the PAW framework
M. Shishkin et al.
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Crystal structure prediction using ab initio evolutionary techniques:: Principles and applications
Artem R. Oganov et al.
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Quantum mechanical modeling of MOSFET gate leakage for high-k gate dielectrics
Huixian Wu et al.
SOLID-STATE ELECTRONICS (2006)
High dielectric constant gate oxides for metal oxide Si transistors
J Robertson
REPORTS ON PROGRESS IN PHYSICS (2006)
Evolution of materials technology for stacked-capacitors in 65 nm embedded-DRAM
E Gerritsen et al.
SOLID-STATE ELECTRONICS (2005)
Ab initio localized basis set study of structural parameters and elastic properties of HfO2 polymorphs
MA Caravaca et al.
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Structural changes induced by lattice-electron interactions:: SiO2 stishovite and FeTiO3 ilmenite
T Yamanaka
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Atomic pair distribution function analysis of materials containing crystalline and amorphous phases
T Proffen et al.
ZEITSCHRIFT FUR KRISTALLOGRAPHIE (2005)
Siticon device scaling to the sub-10-nm regime
M Leong et al.
SCIENCE (2004)
High dielectric constant oxides
J Robertson
EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS (2004)
First-principles investigation of high-κ dielectrics:: Comparison between the silicates and oxides of hafnium and zirconium -: art. no. 184301
GM Rignanese et al.
PHYSICAL REVIEW B (2004)
Trends in the ultimate breakdown strength of high dielectric-constant materials
JW McPherson et al.
IEEE TRANSACTIONS ON ELECTRON DEVICES (2003)
Rutile-type TiO2 thin film for high-k gate insulator
M Kadoshima et al.
THIN SOLID FILMS (2003)
Dielectric constants of Zr silicates: A first-principles study
GM Rignanese et al.
PHYSICAL REVIEW LETTERS (2002)
First-principles study of structural, vibrational, and lattice dielectric properties of hafnium oxide
XY Zhao et al.
PHYSICAL REVIEW B (2002)
Silicon integrated circuit technology from past to future
H Iwai et al.
MICROELECTRONICS RELIABILITY (2002)
High-κ gate dielectrics:: Current status and materials properties considerations
GD Wilk et al.
JOURNAL OF APPLIED PHYSICS (2001)
Alternative dielectrics to silicon dioxide for memory and logic devices
AI Kingon et al.
NATURE (2000)