期刊
NANOSCALE RESEARCH LETTERS
卷 6, 期 -, 页码 1-4出版社
SPRINGER
DOI: 10.1186/1556-276X-6-558
关键词
optics; nanostructure fabrication; polarizing devices
资金
- Federal Ministry of Education and Research (BMBF) [FKZ 13N9712, FKZ 13N9711]
In this work, an effective multistep process toward fabrication of an iridium wire grid polarizer for UV applications involving a frequency doubling process based on ultrafast electron beam lithography and atomic layer deposition is presented. The choice of iridium as grating material is based on its good optical properties and a superior oxidation resistance. Furthermore, atomic layer deposition of iridium allows a precise adjustment of the structural parameters of the grating much better than other deposition techniques like sputtering for example. At the target wavelength of 250 nm, a transmission of about 45% and an extinction ratio of 87 are achieved.
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