期刊
MICROMACHINES
卷 5, 期 2, 页码 228-238出版社
MDPI
DOI: 10.3390/mi5020228
关键词
combined-nanoimprint-and-photolithography; photonic crystals; hybrid mask mold; TM polarizer
类别
资金
- National Science Foundation (NSF) Nanoscale Interdisciplinary Research Team (NIRT) program [BES-0608934]
- National Research Laboratory (NRL) program of the Ministry and Science of Technology [ROA-2007-000-20111-0]
- IT R&D program of MKE in Korea [2008-F-024-02]
- Ministry of Science, ICT and Future Planning, Korea under the Brain Scouting Program [HB606-12-2001]
- Directorate For Engineering
- Div Of Electrical, Commun & Cyber Sys [1307997] Funding Source: National Science Foundation
Photonic crystals have been widely investigated since they have great potential to manipulate the flow of light in an ultra-compact-scale and enable numerous innovative applications. 2D slab photonic crystals for the telecommunication C band at around 1550 nm have multi-scale structures that are typically micron-scale waveguides and deep sub-micron-scale air hole arrays. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. In this work, we report a one-step lithography process to pattern both micron and deep sub-micron features simultaneously for the 2D slab photonic crystal using combined-nanoimprint-andphotolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated, and the operation was successfully demonstrated.
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