4.6 Article

Radiation effects in GaN materials and devices

期刊

JOURNAL OF MATERIALS CHEMISTRY C
卷 1, 期 5, 页码 877-887

出版社

ROYAL SOC CHEMISTRY
DOI: 10.1039/c2tc00039c

关键词

-

资金

  1. International Science and Technology Center ISTC [3870]
  2. DTRA award [HDTRA1-08-10-BRCWMD-BAA]

向作者/读者索取更多资源

This article reviews the effects of radiation damage on GaN materials and devices such as light-emitting diodes and high electron mobility transistors. Protons, electrons and gamma rays typically produce point defects in GaN, in contrast to neutron damage which is dominated by more extended disordered regions. Regardless of the type of radiation, the electrical conductivity of the GaN is reduced through the introduction of trap states with thermal ionization energies deep in the forbidden bandgap. An important practical parameter is the carrier removal rate for each type of radiation since this determines the dose at which device degradation will occur. Many studies have shown that GaN is several orders of magnitude more resistant to radiation damage than GaAs, i.e. it can withstand radiation doses of at least two orders of magnitude higher than those degrading GaAs with a similar doping level. Many issues still have to be addressed. Among them are the strong asymmetry in carrier removal rates in n- and p-type GaN and interaction of radiation defects with Mg acceptors and the poor understanding of interaction of radiation defects in doped nitrides with the dislocations always present.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据