期刊
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
卷 2, 期 8, 页码 N3012-N3017出版社
ELECTROCHEMICAL SOC INC
DOI: 10.1149/2.003308jss
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资金
- Novel Semiconductor Power Electronics Project Realizing Low Carbon Emission Society under Ministry of Economy, Trading Industry (METI)
- New Energy and Industrial Technology Development Organization (NEDO)
We investigated homoepitaxial growth on 4H-SiC Si-face substrate with a vicinal off-angle lower than 1 degrees. The control of the wafer off-angle to a precision of 0.1 degrees is important to controlling the surface morphology of homoepitaxial growth on this substrate. Keeping the C/Si ratio low by controlling the SiH4 flow rate was effective in striking balance between surface morphology and polytype homogeneity. Homoepitaxial layers were successfully grown on whole, 2-inch Si-face vicinal off-angled substrate without large step bunching or polytype inclusions. The quality of the epitaxial layer was confirmed by I-V characteristics of Schottky barrier diodes fabricated on the epitaxial wafer. (C) 2013 The Electrochemical Society. All rights reserved.
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