期刊
NANO-MICRO LETTERS
卷 3, 期 2, 页码 135-140出版社
SHANGHAI JIAO TONG UNIV PRESS
DOI: 10.1007/BF03353663
关键词
Nanoimprint lithography; Soft molecular scale; Nanofabrication
资金
- Natural Science Foundation of Shanghai [11ZR1432100]
- Shanghai Postdoctoral Science Foundation [11R21420900]
Nanoimprint lithography (NIL) is an emerging micro/nano-patterning technique, which is a high-resolution, high-throughput and yet simple fabrication process. According to International Technology Roadmap for Semiconductor (ITRS), NIL has emerged as the next generation lithography candidate for the 22 nm and 16 nm technological nodes. In this paper, we present an overview of nanoimprint lithography. The classfication, research focus, critical issues, and the future of nanoimprint lithography are intensively elaborated. A pattern as small as 2.4 nm has been demonstrated. Full-wafer nanoimprint lithography has been completed on a 12-inch wafer. Recently, 12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group, a leading nanoimprint lithography technology supplier.
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