4.7 Article

Metallic behaviour in SOI quantum wells with strong intervalley scattering

期刊

SCIENTIFIC REPORTS
卷 3, 期 -, 页码 -

出版社

NATURE PUBLISHING GROUP
DOI: 10.1038/srep02011

关键词

-

资金

  1. EPSRC of the UK [EP/I017860/1]
  2. JST-ERATO programs
  3. JSPS [GR103]
  4. Engineering and Physical Sciences Research Council [EP/I017860/1] Funding Source: researchfish
  5. EPSRC [EP/I017860/1] Funding Source: UKRI

向作者/读者索取更多资源

The fundamental properties of valleys are recently attracting growing attention due to electrons in new and topical materials possessing this degree-of-freedom and recent proposals for valleytronics devices. In silicon MOSFETs, the interest has a longer history since the valley degree of freedom had been identified as a key parameter in the observation of the controversial metallic behaviour in two dimensions. However, while it has been recently demonstrated that lifting valley degeneracy can destroy the metallic behaviour, little is known about the role of intervalley scattering. Here, we show that the metallic behaviour can be observed in the presence of strong intervalley scattering in silicon on insulator (SOI) quantum wells. Analysis of the conductivity in terms of quantum corrections reveals that interactions are much stronger in SOI than in conventional MOSFETs, leading to the metallic behaviour despite the strong intervalley scattering.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.7
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据