期刊
RSC ADVANCES
卷 8, 期 54, 页码 31224-31230出版社
ROYAL SOC CHEMISTRY
DOI: 10.1039/c8ra03711f
关键词
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资金
- National Centre for Research and Development [1/346922/4/NCBR/2017, 027/533/L-5/13/NCBR/2014]
- National Science Centre [DEC-2015/19/B/ST7/02494]
- Wroclaw University of Technology
- Slovak-Polish International Cooperation Program
- European Union within the European Regional Development Fund through Innovative Economy [POIG.01.01.02-00-008/08-05]
- National Centre for Research and Development through the Applied Research Program Grant [178782]
In this work, we reported on the development of lithography-free technology for the fabrication of nanopatterned Si substrates. The combination of two phenomena, the solid-state dewetting process and metal-assisted wet chemical etching, allowed for fabrication of Si nanocolumns on large areas in a relatively simple way. The process of dewetting the thin metal layer enabled formation of nickel nanoislands, which were used as a shadow mask in the deposition of a catalytic metal pattern. Application of the two-stage dewetting process with the repetition of the metal deposition and annealing step enabled us to obtain a significant increase in the surface coverage ratio and the surface density of the nanoislands. As a catalytic metal, a gold layer was applied in the metal-assisted wet chemical etching process. The obtained columnar nanostructures showed a great verticality and had a high aspect ratio. In the conducted studies, the maximum etching rate (at RT) was higher than 1.2 m min(-1). The etching rate increased with increasing concentration of oxidizing (H2O2) and etching (HF) agent, with a tendency to saturate for more concentrated solutions. The etching rate was significantly higher for Si substrates with a crystallographic orientation (115) than for (111), but there was no privileged direction of etching except for the direction vertical to the substrate. With increasing layer thickness of the catalytic metal a decrease in the metal-assisted wet chemical etching process efficiency was observed. The developed technology allows for fabrication of patterned substrates with a wide range of lateral dimension of nanocolumns and their density.
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