期刊
ACS PHOTONICS
卷 2, 期 6, 页码 692-698出版社
AMER CHEMICAL SOC
DOI: 10.1021/acsphotonics.5b00148
关键词
all-dielectric metamaterial; perfect reflector; nanosphere lithography; Mie resonance
类别
资金
- Office of Naval Research (ONR) [N00014-14-1-0475, N00014-12-1-0722]
All-dielectric metamaterials offer a potential low-loss alternative to plasmonic metamaterials at optical frequencies. Here, we take advantage of the low absorption loss as well as the simple unit cell geometry to demonstrate large-scale (centimeter-sized) all-dielectric metamaterial perfect reflectors made from silicon cylinder resonators. These perfect reflectors, operating in the telecommunications band, were fabricated using self-assembly based nanosphere lithography. In spite of the disorder originating from the self-assembly process, the average reflectance of the metamaterial perfect reflectors is 99.7% at 1530 nm, surpassing the Moreover, the spectral separation of the electric and magnetic resonances can be chosen to bandwidth while maintaining a high tolerance to disorder. The scalability of this design manipulating light for low-loss and large-area photonic applications.
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