Fabrication of Cu1.8S/CuS nanoplates counter electrode via alternating current etching for quantum dots-sensitized solar cells

We demonstrate a method for fabricating a Cu1.8S/CuS nanoplate counter electrode (CE) via the alternating current (AC) etching of brass. The photoelectrochemical performance and electrocatalytic properties of Cu1.8S/CuS CE with a eta value of 3.22% are much higher than those of Pt and conventional Cu2S CEs. Furthermore, it offers a simple and low cost method for producing CuS counter electrodes in the future.