期刊
RSC ADVANCES
卷 4, 期 61, 页码 32214-32220出版社
ROYAL SOC CHEMISTRY
DOI: 10.1039/c4ra04082a
关键词
-
资金
- national science foundation of China [51371020]
We demonstrate a method for fabricating a Cu1.8S/CuS nanoplate counter electrode (CE) via the alternating current (AC) etching of brass. The photoelectrochemical performance and electrocatalytic properties of Cu1.8S/CuS CE with a eta value of 3.22% are much higher than those of Pt and conventional Cu2S CEs. Furthermore, it offers a simple and low cost method for producing CuS counter electrodes in the future.
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