期刊
OPTICAL MATERIALS EXPRESS
卷 2, 期 12, 页码 1743-1750出版社
OPTICAL SOC AMER
DOI: 10.1364/OME.2.001743
关键词
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资金
- DoD (CEAND) [W911NF-11-1-0209, W911NF-11-1-0133]
- NSF-CREST (CNBMD) [HRD 1036494]
- NSF-RISE [HRD-0931373]
- NSR-MRI
We have demonstrated the nanopatterning of atomic layer deposited (ALD) Al:ZnO (AZO) films using electron beam lithography (EBL) for plasmonic waveguide applications. The influence of grains on repeatable planar nanostructures by nanolithography process was studied for annealed films in order to avoid effects of granularity. Our results demonstrate that the nanopatterning of AZO by the EBL technique is limited due to granularity of ALD grown AZO films. This finding suggests the limitations of ALD grown samples for optical applications where nanopatterns are fabricated by the EBL technique. Furthermore, the ALD grown films lose conductivity orders of magnitude on annealing. (C)2012 Optical Society of America
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