4.6 Article

A tunable three layer phase mask for single laser exposure 3D photonic crystal generations: bandgap simulation and holographic fabrication

期刊

OPTICAL MATERIALS EXPRESS
卷 1, 期 5, 页码 1034-1039

出版社

OPTICAL SOC AMER
DOI: 10.1364/OME.1.001034

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资金

  1. U.S. National Science Foundation [CMMI-0900564, DMR-0934157, CMMI 1115903, CMMI-1109971]
  2. Directorate For Engineering
  3. Div Of Civil, Mechanical, & Manufact Inn [1109971] Funding Source: National Science Foundation
  4. Division Of Materials Research
  5. Direct For Mathematical & Physical Scien [0934157] Funding Source: National Science Foundation
  6. Div Of Civil, Mechanical, & Manufact Inn
  7. Directorate For Engineering [1115903, 0900564] Funding Source: National Science Foundation

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Through the use of a multi-layer phase mask to produce five-beam interference, three-dimensional photonic crystals can be formed through single exposure to a photoresist. In these holographically formed structures, the interconnectivity is controlled by the relative phase difference among contributing beams. Photonic band gaps are calculated and the simulation shows a maximum bandgap of 18% of the middle gap frequency when the phase difference is optimized. A three-layer phase mask is fabricated by placing a spacer layer between two orthogonally-orientated gratings. The phase difference is controlled by thermal-tuning of the spacer thickness. Photonic crystal templates are holographically fabricated in a photosensitive polymer using the phase mask. (C) 2011 Optical Society of America

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