4.6 Article

Femtosecond Laser-Induced Periodic Surface Structures on Fused Silica: The Impact of the Initial Substrate Temperature

期刊

MATERIALS
卷 11, 期 8, 页码 -

出版社

MDPI
DOI: 10.3390/ma11081340

关键词

fs-laser; laser-induced periodic surface structures (LIPSS); fused silica; substrate temperature; supra-wavelength LIPSS; CO2 laser; hydrodynamic instabilities

资金

  1. TMWBK
  2. EFRE (Europaische Fonds fur regionale Entwicklung) [FK 13010-715]
  3. European Union (EU) [657424]
  4. ERDF
  5. state budget of the Czech Republic (project HiLASE CoE) [CZ.02.1.01/0.0/0.0/15_006/0000674]
  6. Marie Curie Actions (MSCA) [657424] Funding Source: Marie Curie Actions (MSCA)

向作者/读者索取更多资源

The formation and properties of laser-induced periodic surface structures (LIPSS) were investigated upon fs-laser irradiation of fused silica at different initial substrate temperatures, T-S. For substrate heating between room temperature, T-RT, and T-S = 1200 degrees C, a continuous wave CO2 laser was used as the radiation source. The surface structures generated in the air environment at normal incidence with five successive fs-laser pulses (pulse duration, tau = 300 fs, laser wavelength, lambda = 1025 nm, repetition frequency, f(rep) = 1 kHz) were characterized by using optical microscopy, scanning electron microscopy, and 2D-Fourier transform analysis. The threshold fluence of fused silica was systematically investigated as a function of T-S. It was shown that the threshold fluence for the formation of low-spatial frequency LIPSS (LSFL) decreases with increasing T-S. The results reveal that the initial spatial period observed at T-RT is notably increased by increasing T-S, finally leading to the formation of supra-wavelength LIPSS. The findings are discussed in the framework of the electromagnetic interference theory, supplemented with an analysis based on thermo-convective instability occurring in the laser-induced molten layer. Our findings provide qualitative insights into the formation mechanisms of LIPSS, which allow improvements of the control of nanostructure formation to be made for corresponding applications of dielectric materials in the future.

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