相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。Rational Design of Functional Oxide Thin Films with Embedded Magnetic or Plasmonic Metallic Nanoparticles
Naoufal Bahlawane et al.
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION (2011)
Molybdenum Atomic Layer Deposition Using MoF6 and Si2H6 as the Reactants
D. Seghete et al.
CHEMISTRY OF MATERIALS (2011)
Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
Maarit Kariniemi et al.
CHEMISTRY OF MATERIALS (2011)
Synthesis and Characterization of Nickel(II) Aminoalkoxides: Application to Molecular Precursors for MOCVD of Ni Thin Films
Seung Ho Yoo et al.
EUROPEAN JOURNAL OF INORGANIC CHEMISTRY (2011)
Sub-30 nm Gate Template Fabrication for Nanoimprint Lithography Using Spacer Patterning Technology
Kun-Sik Park et al.
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY (2011)
Redox Transmetalation of Prickly Nickel Nanowires for Morphology Controlled Hierarchical Synthesis of Nickel/Gold Nanostructures for Enhanced Catalytic Activity and SERS Responsive Functional Material
Sougata Sarkar et al.
JOURNAL OF PHYSICAL CHEMISTRY C (2011)
Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
Windu Sari et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2011)
Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen
Kaupo Kukli et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2011)
Atomic Layer Deposition of Ni Thin Films and Application to Area-Selective Deposition
Woo-Hee Kim et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2011)
Filling Narrow Trenches by Iodine-Catalyzed CVD of Copper and Manganese on Manganese Nitride Barrier/Adhesion Layers
Yeung Au et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2011)
CVD of Ru, Pt and Pt-based alloy thin films using ethanol as mild reducing agent
P. Antony Premkumar et al.
MATERIALS CHEMISTRY AND PHYSICS (2011)
Colloidal metal nanoparticles as a component of designed catalyst
Chun-Jiang Jia et al.
PHYSICAL CHEMISTRY CHEMICAL PHYSICS (2011)
Atomic Layer Deposition on Phase-Shift Lithography Generated Photoresist Patterns for 1D Nanochannel Fabrication
Firat Gueder et al.
ACS APPLIED MATERIALS & INTERFACES (2010)
Novel Core-Shell Sn-Cu Anodes for Lithium Rechargeable Batteries Prepared by a Redox-Transmetalation Reaction
Min Gyu Kim et al.
ADVANCED MATERIALS (2010)
Atomic Layer Deposition: An Overview
Steven M. George
CHEMICAL REVIEWS (2010)
CVD Elaboration of Nanostructured TiO2-Ag Thin Films with Efficient Antibacterial Properties
Jitti Mungkalasiri et al.
CHEMICAL VAPOR DEPOSITION (2010)
Nickel and Nickel-Based Nanoalloy Thin Films from Alcohol-Assisted Chemical Vapor Deposition
Naoufal Bahlawane et al.
CHEMISTRY OF MATERIALS (2010)
Investigation on the Growth Initiation of Ru Thin Films by Atomic Layer Deposition
Seong Keun Kim et al.
CHEMISTRY OF MATERIALS (2010)
Investigation of AlMe3, BEt3, and ZnEt2 as Co-Reagents for Low-Temperature Copper Metal ALD/Pulsed-CVD
Balamurugan Vidjayacoumar et al.
CHEMISTRY OF MATERIALS (2010)
Growth of Cu Metal Films at Room Temperature Using Catalyzed Reactions
Sang-Woo Kang et al.
CHEMISTRY OF MATERIALS (2010)
Local deposition of high-purity Pt nanostructures by combining electron beam induced deposition and atomic layer deposition
A. J. M. Mackus et al.
JOURNAL OF APPLIED PHYSICS (2010)
(MeCp)Ir(CHD) and molecular oxygen as precursors in atomic layer deposition of iridium
Jani Hamalainen et al.
JOURNAL OF MATERIALS CHEMISTRY (2010)
Selective-Area Atomic Layer Deposition Using Poly(vinyl pyrrolidone) as a Passivation Layer
Elina Farm et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2010)
Area Selective Atomic Layer Deposition by Microcontact Printing with a Water-Soluble Polymer
Marja N. Mullings et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2010)
High Quality Area-Selective Atomic Layer Deposition Co Using Ammonia Gas as a Reactant
Han-Bo-Ram Lee et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2010)
Liquid injection atomic layer deposition of silver nanoparticles
P. R. Chalker et al.
NANOTECHNOLOGY (2010)
Formation and structural transition of molecular self-assembly on solid surface investigated by scanning tunneling microscopy
Dong Wang et al.
MATERIALS SCIENCE & ENGINEERING R-REPORTS (2010)
The incorporation of preformed metal nanoparticles in zinc oxide thin films using aerosol assisted chemical vapour deposition
A. Salauen et al.
THIN SOLID FILMS (2010)
Low-Temperature Atomic Layer Deposition of Copper Metal Thin Films: Self-Limiting Surface Reaction of Copper Dimethylamino-2-propoxide with Diethylzinc
Byoung H. Lee et al.
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION (2009)
Area-Selective ALD with Soft Lithographic Methods: Using Self-Assembled Monolayers to Direct Film Deposition
Xirong Jiang et al.
JOURNAL OF PHYSICAL CHEMISTRY C (2009)
CVD of Conducting Ultrathin Copper Films
Naoufal Bahlawane et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2009)
Metal nanoparticle synthesis using supercritical alcohol
Jaehoon Kim et al.
MATERIALS LETTERS (2009)
DLI-CVD of TiO2-Cu antibacterial thin films: Growth and characterization
J. Mungkalasiri et al.
SURFACE & COATINGS TECHNOLOGY (2009)
Platinum OMCVD processes and precursor chemistry
Cyril Thurier et al.
COORDINATION CHEMISTRY REVIEWS (2008)
Mass-spectrometric monitoring of the thermally induced decomposition of trimethylgallium, tris(tert-butyl) gallium, and triethylantimony at low pressure conditions
Naoufal Bahlawane et al.
JOURNAL OF THE AMERICAN SOCIETY FOR MASS SPECTROMETRY (2008)
Photonic metamaterials by direct laser writing and silver chemical vapour deposition
Michael S. Rill et al.
NATURE MATERIALS (2008)
New precursors for CVD copper metallization
John A. T. Norman et al.
MICROELECTRONIC ENGINEERING (2008)
Effect of solvent on the growth of co and CO2C using pulsed-spray evaporation chemical vapor deposition
Peter Antony Premkumar et al.
CHEMISTRY OF MATERIALS (2007)
Synthesis and surface engineering of complex nanostructures by atomic layer deposition
Mato Knez et al.
ADVANCED MATERIALS (2007)
Hydrogen plasma-enhanced atomic layer deposition of copper thin films
Liqi Wu et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2007)
Self-catalyzed chemical vapor deposition method for the growth of device-quality metal thin films
N. Bahlawane et al.
MICROELECTRONIC ENGINEERING (2007)
Overview of coating growth mechanisms in MOCVD processes as observed in Pt group metals
Igor K. Igumenov et al.
CHEMICAL VAPOR DEPOSITION (2007)
Catalytically enhanced H2-free CVD of transition metals using commercially available precursors
N. Bahlawane et al.
SURFACE & COATINGS TECHNOLOGY (2007)
Alcohol-assisted CVD of silver using commercially available precursors
Naoufal Bahlawane et al.
CHEMICAL VAPOR DEPOSITION (2007)
High density Ru nanocrystal deposition for nonvolatile memory applications
Damon B. Farmer et al.
JOURNAL OF APPLIED PHYSICS (2007)
CVD of metals using alcohols and metal acetylacetonates, Part I:: Optimization of process parameters and electrical characterization of synthesized films
Peter Antony Premkumar et al.
CHEMICAL VAPOR DEPOSITION (2007)
CVD of metals using alcohols and metal acetylacetonates, Part II:: Role of solvent and characterization of metal films made by pulsed spray evaporation CVD
Peter Antony Premkumar et al.
CHEMICAL VAPOR DEPOSITION (2007)
Highly bioactive silver and silver/titania composite films grown by chemical vapour deposition
L. A. Brook et al.
JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY (2007)
Vapor deposition of ruthenium from an amidinate precursor
Huazhi Li et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2007)
Area-selective atomic layer deposition of platinum on YSZ substrates using microcontact printed SAMs
Xirong Jiang et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2007)
Comparative study of Cu-CVD seed layer deposition on Ru and Ta underlayers
Hoon Kim et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2007)
Heterostructured magnetic nanoparticles: their versatility and high performance capabilities
Young-wook Jun et al.
CHEMICAL COMMUNICATIONS (2007)
Atomic layer deposition of palladium films on Al2O3 surfaces
J. W. Elam et al.
THIN SOLID FILMS (2006)
Purification of platinum and gold structures after electron-beam-induced deposition
A. Botman et al.
NANOTECHNOLOGY (2006)
Atomic layer deposition of Pd on an oxidized metal substrate
Gregory A. Ten Eyck et al.
CHEMICAL VAPOR DEPOSITION (2006)
Chemistry for positive pattern transfer using area-selective atomic layer deposition
R Chen et al.
ADVANCED MATERIALS (2006)
Aerosol assisted chemical vapor deposition using nanoparticle precursors: A route to nanocomposite thin films
RG Palgrave et al.
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY (2006)
Atomic layer deposition of ultrathin copper metal films from a liquid copper(I) amidinate precursor
Zhengwen Li et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2006)
Highly conformal deposition of pure Co films by MOCVD using Co-2(CO)(8) as a precursor
J Lee et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2006)
Redox-transmetalation process as a generalized synthetic strategy for core-shell magnetic nanoparticles
WR Lee et al.
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY (2005)
New CVD precursors capable of depositing copper metal under mixed O2/Ar atmosphere
E Lay et al.
INORGANIC CHEMISTRY (2005)
Mechanism of Ni film CVD with a Ni(Ktfaa)2 precursor on a silicon substrate
VV Bakovets et al.
CHEMICAL VAPOR DEPOSITION (2005)
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
RL Puurunen
JOURNAL OF APPLIED PHYSICS (2005)
Growth mode during initial stage of chemical vapor deposition
Y Kajikawa et al.
APPLIED SURFACE SCIENCE (2005)
CVD with Tri-nbutylphosphine silver(I) complexes:: Mass spectrometric investigations and depositions
T Haase et al.
CHEMICAL VAPOR DEPOSITION (2005)
[(1,5-cyclooctadiene)(toluene)ruthenium(0)]: A novel precursor for the MOCVD of thin ruthenium films
A Schneider et al.
CHEMICAL VAPOR DEPOSITION (2005)
Synthesis of Cu(II) aminoalkoxide complexes and their unusual thermolysis to Cu(0)
JW Park et al.
INORGANIC CHEMISTRY COMMUNICATIONS (2004)
A study on the selective organometallic vapor deposition of palladium onto self-assembled monolayers of 4,4′-biphenyldithiol, 4-biphenylthiol, and 11-mercaptoundecanol on polycrystalline silver
U Weckenmann et al.
CHEMISTRY OF MATERIALS (2004)
Synthesis and characterization of tris(β-ketoiminato)ruthenium(III) complexes:: Potential precursors for CVD of Ru and RuO2 thin films
TY Chou et al.
CHEMICAL VAPOR DEPOSITION (2004)
Substrate-independent palladium atomic layer deposition
JJ Senkevich et al.
CHEMICAL VAPOR DEPOSITION (2003)
MOCVD of platinum films from (CH3)3CH3CpPt and Pt(acac)2:: Nanostructure, conformality, and electrical resistivity
J Goswami et al.
CHEMICAL VAPOR DEPOSITION (2003)
A study on the metal-organic CVD of pure copper films from low cost copper(II) dialkylamino-2-propoxides: Tuning the thermal properties of the precursor by small variations of the ligand
R Becker et al.
CHEMICAL VAPOR DEPOSITION (2003)
Deposition of palladium and ruthenium β-diketonates on alumina and silica supports in gas and liquid phase
M Lashdaf et al.
APPLIED CATALYSIS A-GENERAL (2003)
Atomic layer deposition of transition metals
BS Lim et al.
NATURE MATERIALS (2003)
Aerosol-assisted chemical vapour deposition of silver films from adducts of functionalised silver carboxylates
DA Edwards et al.
JOURNAL OF MATERIALS CHEMISTRY (2003)
Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing
H Kim
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2003)
Synthesis and physical and structural characterization of Ag(I) complexes supported by non-fluorinated β-diketonate and related ancillary ligands
SC Ngo et al.
POLYHEDRON (2002)
Crystallographic and electrical properties of platinum film grown by chemical vapor deposition using (methylcyclopentadienyl)trimethylplatinum
M Hiratani et al.
THIN SOLID FILMS (2002)
Aerosol-assisted chemical vapour deposition (AACVD) of silver films from triorganophosphine adducts of silver carboxylates, including the structure of [Ag(O2CC3F7)(PPh3)2]
DA Edwards et al.
INORGANICA CHIMICA ACTA (2002)
Characterization of platinum films deposited by focused ion beam-assisted chemical vapor deposition
KA Telari et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2002)
Disproportionation of dimethylalane on aluminum surfaces. Part 1. Experimental studies
BG Willis et al.
SURFACE SCIENCE (2001)
Synthesis of solid solution and core-shell type cobalt-platinum magnetic nanoparticles via transmetalation reactions
JI Park et al.
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY (2001)
Additive fabrication and the mechanisms of nucleation and growth in chemical vapor deposition processes
EL Crane et al.
ACCOUNTS OF CHEMICAL RESEARCH (2000)
Development and qualification of a vacuum pumping system for metalorganic vapor phase epitaxy copper precursors
RP Davis et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2000)
Incubation time for chemical vapor deposition of copper from hexafluoroacetylacetonate-copper(I)-vinyltrimethoxysilane
LS Hong et al.
APPLIED SURFACE SCIENCE (2000)
Mechanistic studies of CVD metallization processes:: Reactions of rhodium and platinum β-diketonate complexes on copper surfaces
EL Crane et al.
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY (2000)
Studies of metallic thin film growth in an atomic layer epitaxy reactor using M(acac)2 (M = Ni, Cu, Pt) precursors
M Utriainen et al.
APPLIED SURFACE SCIENCE (2000)