期刊
ZEITSCHRIFT FUR KRISTALLOGRAPHIE-CRYSTALLINE MATERIALS
卷 226, 期 12, 页码 944-955出版社
WALTER DE GRUYTER GMBH
DOI: 10.1524/zkri.2011.1437
关键词
Amorphous material; X-ray diffraction; Quantitative phase analysis; Calibration
The presence of amorphous materials in crystalline samples is an increasingly important issue for diffractionists. Traditional phase quantification via the Rietveld method fails to take into account the occurrence of amorphous material in the sample and without careful attention on behalf of the operator its presence would remain undetected. Awareness of this issue is increasing in importance with the advent of nanotechnology and the blurring of the boundaries between amorphous and crystalline species. The methodology of a number of different approaches to the determination of amorphous content via X-ray diffraction and an assessment of their performance, is described. Laboratory-based, X-ray diffraction data from a suite of synthetic samples, with amorphous content ranging from 0.0 to 50 wt%, has been analysed using both direct (in which the contribution of the amorphous component to the pattern is used to obtain an estimate of concentration) and indirect (where the absolute abundances of the crystalline components are used to estimate the amorphous content by difference) methodologies. In addition, both single peak and whole pattern methodologies have been assessed. All methods produce reasonable results, however the study highlights some of the strengths, deficiencies and applicability of each of the approaches.
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