期刊
ZEITSCHRIFT FUR KRISTALLOGRAPHIE-CRYSTALLINE MATERIALS
卷 225, 期 12, 页码 610-615出版社
WALTER DE GRUYTER GMBH
DOI: 10.1524/zkri.2010.1354
关键词
Coherent; Inhomogeneity; X-ray diffractive imaging; Silicon-On-Insulator
资金
- EPSRC [EP/G068437/1] Funding Source: UKRI
- Engineering and Physical Sciences Research Council [EP/G068437/1] Funding Source: researchfish
We report our research on X-ray micro-beam diffraction and coherent X-ray diffractive imaging techniques to study structural inhomogeneities in Silicon-On-Insulator continuous plain wafers. Inhomogeneities were measured quantitatively and attributed to limitations of the manufacturing process. 3-dimensional image reconstructions were performed by using our Error-Reduction and Hybrid-Input-Output iterative algorithms. These revealed images of the focussed X-ray beam passing through the active layer of the wafer.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据