3.9 Article

High Endurance and Multilevel Operation in Oxide Semiconductor-Based Resistive RAM Using Thin-Film Transistor as a Selector

期刊

ECS SOLID STATE LETTERS
卷 4, 期 9, 页码 Q41-Q43

出版社

ELECTROCHEMICAL SOC INC
DOI: 10.1149/2.0061508ssl

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  1. National Chiao Tung University of Taiwan [103-2221-E-009-010-MY3.]
  2. Ministry of Science and Technology, Taiwan, R.O.C. [103-2221-E-009-010-MY3]

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Resistive random access memory (RRAM) composed of Ti/AlZnSnO (AZTO)/HfO2/Pt structure associated with one thin film transistor (TFT) architecture are investigated. The proposed 1T1R devices show superior performance via an excellent current limiter, namely, an oxide semiconductor-based TFT. Multilevel storage characteristics are demonstrated by modulating the amplitude of the TFT gate voltage. The four resistance levels are clearly obtained with stable retention ability at a least 10(4) s at 85 degrees C. Electric-pulse-induced resistance switching test up to 10(8) switching cycles are conducted. Experimental results show the 1T1R AZTO-based RRAM with reliable endurance and multilevel operation has great potential for system-on-panel (SoP) applications. (C) 2015 The Electrochemical Society. All rights reserved.

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