期刊
VACUUM
卷 103, 期 -, 页码 14-16出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.vacuum.2013.11.009
关键词
Magnetron sputtering; Nickel oxide; Oxygen partial pressures; Electrical properties
资金
- 973 program [2011CB302005]
- National Natural Science Foundation of China [61006006, 61076045, 60877020, 11304112, 60976010]
- Science and Technology Development Project in Jilin Province [20100170]
- Fundamental Research Funds for the Central Universities [dut11rc(3)45]
The NiO films were sputtered by radio frequency (rf) magnetron sputtering at different oxygen partial pressures. The structures, electrical and optical properties of the NiO films were investigated. The resulting films were analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and ultraviolet-visible spectrophotometer (UV). The electrical properties were measured by Hall system. The results show that the NiO films deposited at room temperature with the ratio of oxygen partial pressures varying from 0 to 80% develop only (200) preferred orientation and very high optical transmittances. The lowest resistivity of 2.368 Omega cm and highest carrier density of 2.235 x 10(19) cm(-3) could be obtained. Comparatively, the controllable electrical properties of the films can be achieved by the variation of crystal quality arises from the oxygen partial pressures. (C) 2013 Elsevier Ltd. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据