期刊
VACUUM
卷 83, 期 3, 页码 501-505出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.vacuum.2008.04.049
关键词
Microwave plasma; High-density plasma; Surface treatment; Hydrophilicity; Copper adhesion; Polyimide film
A high-density microwave plasma has been applied to the surface of polyimide (PI) films as a treatment to enhance the adhesion of sputter-deposited copper layers. A very short (similar to 5 s) exposure to At plasma enhanced the contact angle from 72 degrees to similar to 14 degrees. X-ray photoelectron spectroscopy and atomic force microprobe measurements showed an increase in hydrophilic radicals (-OH, -C=O) and surface roughness, respectively, following the plasma treatment. Peel strength tests of Cu layers deposited on plasma-treated polyimide films showed that the plasma treatment significantly enhanced Cu layer adhesion. (C) 2008 Elsevier Ltd. All rights reserved
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