期刊
VACUUM
卷 83, 期 2, 页码 435-443出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.vacuum.2008.04.077
关键词
Mo nanoparticles; ECR plasma; Hollow cathode chemical sputtering; Scanning tunneling microscopy; Field emission microscopy
资金
- Department of Science and Technology, Government of India
- CNQS, UoP, Pune
Cathodic sputtering is demonstrated to be effective in synthesizing thin films of molybdenum nanoparticles. An electron cyclotron resonance plasma reactor has been used as the source. The particle size distribution is found to be controllable by proper choice of the cathodic bias potential. Sizes ranging between 20 and 30 nm deposited at the optimum bias potential are found to exhibit a self assembled structure as observed by scanning tunneling microscopy. Field emission microscopic studies on these films supported on W have exhibited very stable emission current over a period of 3 h. (C) 2008 Elsevier Ltd. All rights reserved.
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