4.4 Article Proceedings Paper

Laser assisted atom probe analysis of thin film on insulating substrate

期刊

ULTRAMICROSCOPY
卷 111, 期 6, 页码 557-561

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.ultramic.2010.11.008

关键词

Atom probe; Ultraviolet femtosecond laser; Insulating substrate

资金

  1. CREST, Japan Science and Technology Agency
  2. World Premier International (WPI) Research Center Initiative on Materials Nanoarchitronics, MEXT, Japan

向作者/读者索取更多资源

We demonstrate that the atom probe analyses of metallic thin films on insulating substrates are possible using laser assisted field evaporation. The tips with metallic thin film and insulating substrate (0.6-3 mu m in thickness) were prepared by the lift-out and annular ion beam milling techniques on tungsten supports. In spite of the existence of thick insulating layer between the metallic film and the tungsten support, atom probe tomography with practical mass resolution, signal-to-noise ratio and spatial resolution was found to be possible using laser assisted field evaporation. (C) 2010 Elsevier B.V. All rights reserved.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.4
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据