4.4 Article

Double aberration correction in a low-energy electron microscope

期刊

ULTRAMICROSCOPY
卷 110, 期 11, 页码 1358-1361

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.ultramic.2010.07.007

关键词

Aberration correction; Low-energy electron microscopy; High resolution electron microscopy

资金

  1. Federal German Ministry of Education and Science (BMBF) [05 KS4WWB/4]

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The lateral resolution of a surface sensitive low-energy electron microscope (LEEM) has been improved below 4 nm for the first time. This breakthrough has only been possible by simultaneously correcting the unavoidable spherical and chromatic aberrations of the lens system. We present an experimental criterion to quantify the aberration correction and to optimize the electron optical system. The obtained lateral resolution of 2.6 nm in LEEM enables the first surface sensitive, electron microscopic observation of the herringbone reconstruction on the Au(1 1 1) surface. (C) 2010 Elsevier B.V. All rights reserved.

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