期刊
ADVANCED OPTICAL MATERIALS
卷 3, 期 3, 页码 398-403出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adom.201400545
关键词
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资金
- Deutsche Forschungsgemeinschaft [SPP1391, FOR730, GI 269/11-1]
- Bundesministerium fur Bildung und Forschung [13N9048, 13N10146]
- ERC Advanced Grant COMPLEXPLAS
- Baden-Wurttemberg (PROTEINSENS, Spitzenforschung II)
- Carl-Zeiss Foundation
- Alexander von Humboldt-Foundation
- Ministerium fur Wissenschaft, Forschung und Kunst Baden-Wurttemberg [Az: 7533-7-11.6- 8]
Optical elements with absorbance close to unity are of crucial importance for diverse applications, ranging from thermal imaging to sensitive trace gas detection. A key factor for the performance of such devices is the need for absorbance with high acceptance angles, which are able to utilize all incident radiation from the forward-facing half-space. Here, a tunable, angle-, and polarization independent large-area perfect absorber is reported, which is fabricated by a combination of colloidal lithography and dry-etching. This design is easy and fast to produce, and low-cost compared with other common methods. Variation of the dry-etching time shifts the resonance from almost 825 to 1025 nm with reflection smaller than 3% and zero transmission. Due to the inherent disordered arrangement, this design is fully polarization independent and the absorbance remains higher than 98% for incident angles up to 50 degrees.
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