期刊
ADVANCED OPTICAL MATERIALS
卷 3, 期 5, 页码 680-686出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adom.201400561
关键词
chiral metasurfaces; hole-mask colloidal lithography; large-area low-cost complex plasmonics; multiline spectra; multishape single-layer metasurfaces
资金
- DFG
- BMBF
- ERC (ComplexPlas)
- AvH-Stiftung
- GIF
- BW-Stiftung
- MWK-BW
- MPI-FKF
- ARC [LF100100117]
- Bessel Prize from AvH
- BW-Spitzenforschung II
- ANN
- DIISR
A novel fabrication method, multiple repetitions of hole-mask colloidal nanolithography, is introduced to create single-layer metasurfaces with complex, multishape plasmonic nanostructures that exhibit desired optical functionalities. Large-area and low-cost fabrication of different samples with independently tunable resonances are demonstrated. These single-layer metasurfaces may find applications as multiline surface-enhanced infrared absorption and broadband substrates. This fabrication method is particularly suited for the creation of large-area, single-layer C-3-rotationally symmetric, 3D chiral metasurfaces, and this approach circumvents common problems with elliptical birefringence and can be utilized for interaction with chiral substances.
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