期刊
TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING
卷 88, 期 3, 页码 154-157出版社
MANEY PUBLISHING
DOI: 10.1179/174591910X12692576434617
关键词
Glow discharge time-of-flight mass spectrometry; Anodic alumina; Anodic tantala; Thin films
资金
- European Union
- Engineering and Physical Sciences Research Council [EP/H020047/1] Funding Source: researchfish
- EPSRC [EP/H020047/1] Funding Source: UKRI
The performance of a newly developed pulsed RF glow discharge time-of-flight mass spectrometer (GD TOFMS) in analysis of elemental distributions of impurity species, particularly Cr, B, P, Cl and Cu in anodic film on aluminium and beneath the anodic alumina/aluminium interface and P, B, Cr and H in anodic film on tantalum and beneath the anodic tantala/tantalum interface, with high resolution is presented. The orthogonal TOFMS combined with an appropriate acquisition system enables monitoring of ion signals within the glow discharge period, i.e. during the RF pulse, and within following afterglow, where signals of high intensity, resulting from Penning ionisation, are observed. It was found that GD TOFMS profiling is an extremely powerful and reliable technique for depth profiling analysis that is confirmed from the depth distribution of impurities in the thin, non-conducting, anodic oxide films. The developed configuration allows analysis of layers as thin as 2 nm thickness that are enriched with both positive and negative ions.
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