期刊
TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA
卷 19, 期 2, 页码 359-363出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/S1003-6326(08)60278-2
关键词
Ta2O5 thin films; DC reactive magnetron sputtering; sputtering pressure; rapid thermal annealing(RTA)
资金
- National Natural Science Foundation of China [60371046]
Ta2O5 thin films were deposited by DC reactive magnetron sputtering followed by rapid thermal annealing(RTA). Influence of sputtering pressure and annealing temperature on surface characteristics, microstructure and optical property of Ta2O5 thin films were investigated. As-deposited Ta2O5 thin films are amorphous. It takes hexagonal structure (delta-Ta2O5) after being annealed at 800 degrees C. A transition from delta-Ta2O5 to orthorhombic structure (L-Ta2O5) occurs at 900-1000 degrees C. Surface roughness is decreased after annealing at low temperature. Refractive index and extinction coefficient are decreased when annealing temperature is increased.
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