期刊
THIN SOLID FILMS
卷 562, 期 -, 页码 126-131出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2014.04.005
关键词
Lithium fluoride; Thin films; Multifractal analysis; Surface morphology; Multifractal detrended moving average
类别
资金
- UGC-CSIR
- DST/MoES/ISRO
- DST, Govt. of India [IR/S2/PF/0001/2009]
The Atomic Force Microscopy technique is used to characterize the surface morphology of LiF thin films deposited at substrate temperatures 77 K, 300 K and 500 K, respectively. It is found that the surface roughness of thin film increases with substrate temperature. The multifractal nature of the LiF thin film at each substrate temperature is investigated using the backward two-dimensional multifractal detrended moving average analysis. The strength of multifractility and the non-uniformity of the height probabilities of the thin films increase as the substrate temperature increases. Both the width of the multifractal spectrum and the difference of fractal dimensions of the thin films increase sharply as the temperature reaches 500 K, indicating that the multifractility of the thin films becomes more pronounced at the higher substrate temperatures with greater cluster size. (C) 2014 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据