期刊
THIN SOLID FILMS
卷 540, 期 -, 页码 162-167出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2013.05.156
关键词
Azo-polymer; Interference lithography; Metal nanostructures; Surface relief gratings
类别
资金
- Academy of Finland [134029]
- Academy of Finland (AKA) [134029, 134029] Funding Source: Academy of Finland (AKA)
Metal micro- and nanostructures for optical and electronic applications are typically fabricated by means of interferometric optical or electron-beam lithographies using conventional photo-or electron-beam resists. In this work, we report on fabrication of periodic nanostructures of gold by exploiting photoinduced surface-relief gratings in an azobenzene-functionalized polymer film as masks for reactive ion etching of the metal. The proposed technique provides a convenient, fast and flexible alternative to photoresist-based lithography for fabricating metal nanostructures of large surface area. Owing to the fact that the azo-polymer is sensitive to the polarization rather than the intensity modulation of the exposing light, the technique is particularly suitable for patterning highly reflective surfaces. (C) 2013 Elsevier B.V. All rights reserved.
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