期刊
THIN SOLID FILMS
卷 527, 期 -, 页码 26-30出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2012.12.031
关键词
Nitrogen-doped nickel oxide; Electrochromic properties; Reversibility; Coloration efficiency; Switching kinetics; Sputtering
类别
资金
- U.S. Department of Energy [DE-AC36-08-GO28308]
- Colorado School of Mines
- National Renewable Energy Laboratory as part of the DOE Office of Energy Efficiency and Renewable Energy Office of Building Technologies Program
In this work, Ni oxide and nitrogen (N)-doped Ni oxide electrochromic films were fabricated with radio frequency magnetron sputtering from a ceramic Ni oxide target. Nitrogen gas was used as the precursor for N doping. The N dopant resulted in Ni oxide films with decreased lattice parameters, increased degree of crystallinity and enhanced surface roughness. The electrochromic performance of the resulting films was evaluated in a LiClO4 electrolyte dissolved in propylene carbonate. The charge reversibility and coloration efficiency as well as the coloration and bleaching kinetics for the N-doped Ni oxide films were significantly improved relative to the undoped Ni oxide films. (C) 2012 Elsevier B. V. All rights reserved.
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