期刊
THIN SOLID FILMS
卷 548, 期 -, 页码 437-442出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2013.09.056
关键词
Laser doping; Laser crystallization; Silicon; Nanoparticles; Photovoltaics
类别
资金
- DFG
- Ministry of Innovation, Science and Research of the State of North Rhine-Westphalia, Germany within the NanoEnergieTechnikZentrum (NETZ, Objective 2 Programme: European Regional Development Fund, ERDF)
- ICAN
Crystalline Si substrates are doped by laser annealing of solution processed Si. For this experiment, dispersions of highly B-doped Si nanoparticles are deposited onto intrinsic Si and laser processed using an 807.5 nm continuous wave laser. During laser processing the particles as well as a surface-near substrate layer are melted to subsequently crystallize in the same orientation as the substrate. The doping profile is investigated by secondary ion mass spectroscopy revealing a constant B concentration of 2 x 10(18) cm(-3) throughout the entire analyzed depth of 5 mu m. Four-point probe measurements demonstrate that the effective conductivity of the doped sample is increased by almost two orders of magnitude. The absolute doping depth is estimated to be in between 8 mu m and 100 mu m. Further, a pn-diode is created by laser doping an n-type c-Si substrate using the Si NPs. (C) 2013 Published by Elsevier B. V.
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