期刊
THIN SOLID FILMS
卷 520, 期 19, 页码 6318-6327出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2012.05.031
关键词
Molybdenum; Oxides; Oxidation state; Sulphuric acid; Sodium hydroxide; X-ray photoelectron spectroscopy; Rutherford backscattering spectroscopy; Nuclear reaction analysis
类别
资金
- Engineering and Physical Sciences Research Council (U.K.)
- EPSRC [EP/H020047/1] Funding Source: UKRI
- Engineering and Physical Sciences Research Council [EP/H020047/1] Funding Source: researchfish
X-ray photoelectron spectroscopy is used to investigate the oxidation states of molybdenum in thin films formed potentiostatically, over a range of potentials, in either 1 mol dm(-3) H2SO4 or 10 mol dm(-3) NaOH at 20 degrees C. Mo 3d spectra suggested that MoO2 and Mo(OH)(2) were the main components of the films, with smaller amounts of MoO3 and possibly Mo2O5. O 1s spectra indicated the presence of oxygen as oxide and hydroxide species and as bound water. Ion beam analysis revealed the formation of thin films at all potentials, with significant losses of oxidized molybdenum to the electrolyte. (C) 2012 Elsevier B. V. All rights reserved.
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