期刊
THIN SOLID FILMS
卷 520, 期 14, 页码 4703-4706出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2011.10.113
关键词
Atomic layer deposition; TCO; ZnO; Aluminium doping; XRD; Resistivity; Orientation
The aim of this work is to study the effects of deposition temperature and aluminium incorporation on the crystalline properties, orientation and grain size of atomic layer deposited ZnO layers. X-ray diffraction analysis revealed a change in the dominant crystallite orientation with increasing substrate temperature. The most perfect crystal structure and largest grain size was found at 2 at.% aluminium content. Accumulation of compressive strain developed a monotonous increase with the growth temperature. Electric resistivity showed no anisotropy despite the change in the orientation, therefore the dominant conduction mechanism is not grain boundary related.(C) 2011 Elsevier B.V. All rights reserved.
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