Normally-off characteristics of LiNbO3/AlGaN/GaN ferroelectric field-effect transistor

With the help of MgO mask layer, LiNbO3 (LN) ferroelectric films were etched effectively using wet etching method and LN/AlGaN/GaN ferroelectric field-effect transistors (FFETs) were fabricated. The electrical properties of the FFETs were studied. Due to the ferroelectric polarization nature of LN films, normally-off characteristics with a turn-on voltage of about + 1.0 V were exhibited in the device. The operation mechanisms of the LN/AlGaN/GaN FFET devices were proposed by the numerical calculations of the electronic band structure and charge distribution. (C) 2012 Elsevier B. V. All rights reserved.