期刊
THIN SOLID FILMS
卷 520, 期 1, 页码 280-286出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2011.07.066
关键词
Cuprite; RF magnetron sputtering; Thin films; Residual stress
类别
资金
- Fondazione Cassa di Risparmio di Trento e Rovereto
Cuprous oxide thin films were produced on soda-lime glass substrates using reactive RF-magnetron sputtering. The influence of deposition parameters and temperature on composition and structural properties of the single layers was extensively studied using X-ray diffraction. The control over microstructure and residual stresses is possible by changing reactive gas pressure and deposition temperature. Fiber textured Cu2O films showing a [100] preferred orientation and a fraction of untextured domains can be obtained: suitable modeling taking this microstructure into account shows the presence of a strong compressive stress decreasing with the temperature. Highly reproducible films can be obtained, whose microstructure is preserved when sputtering on tungsten and zinc oxide substrates. (C) 2011 Elsevier B.V. All rights reserved.
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