Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma

Changes in the plasma non-uniformity and the electron energy distribution function (EEDF) by increasing RF bias power were observed in inductively coupled plasma using spatially resolved radial EEDF measurements. As the bias power was increased at a fixed ICP power at a low gas pressure, The EEDF was evolved from a bi-Maxwellian to a Maxwellian distribution. The plasma density was decreased in all radial positions and thus plasma non-uniformity was slightly changed. However, strongly improved plasma spatial non-uniformity was observed at a high gas pressure with a decrease in the center-plasma density and an increase in the radial edge-plasma density. This result could be understood by combined effects of the ion acceleration loss and the non-uniform power deposition due to the RF bias power. (C) 2011 Published by Elsevier B.V.