期刊
THIN SOLID FILMS
卷 518, 期 20, 页码 5762-5768出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2010.05.095
关键词
Coatings; Sputtering; X-ray diffraction; Scanning electron microscopy; Surface morphology; Hardness
类别
资金
- management of Charotar University of Science and Technology, Changa
- AICTE, New Delhi, in India
Chromium nitride thin films were deposited on SA-304 stainless steel substrates by using direct-current reactive magnetron sputtering. The influence of process conditions such as nitrogen content in the fed gas, substrate temperature, and different sputtering gases on microstructural characteristics of the films was investigated. The films showed (200) preferred orientation at low nitrogen content (<30%) in the fed gas. The formation of Cr2N and CrN phases was observed when 30% and 40% N-2 were used, with a balance of Ar, respectively. Field emission scanning electron microscopy and atomic force microscopy were used to characterize the morphology and surface topography of the thin films, respectively. Microhardness tests showed a maximum hardness of 16.95 GPa for the 30% nitrogen content. (C) 2010 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据