期刊
THIN SOLID FILMS
卷 518, 期 15, 页码 4095-4099出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2009.10.153
关键词
Glancing angle deposition; Tungsten trioxide; Nanorods; Pulsed DC sputtering; Scanning electron microscopy; X-ray photoelectron spectroscopy
类别
资金
- W.M. Keck Foundation
Nanostructured tungsten (W) and tungsten trioxide (WO(3)) fin-is were prepared by glancing angle deposition using pulsed direct current magnetron sputtering at room temperature with continuous substrate rotation. The chemical compositions of the nanostructured films were characterized by X-ray photoelectron spectroscopy, and the film structures and morphologies were investigated using X-ray diffraction and high resolution scanning electron microscopy. Both as-deposited and air annealed tungsten trioxide films exhibit nanostructured morphologies with an extremely high surface area, which may potentially increase the sensitivity of chemiresistive WO(3) gas sensors. Metallic W nanorods formed by sputtering in a pure Ar plasma at room temperature crystallized into a predominantly simple cubic beta-phase with < 100 > texture although evidence was found for other random grain orientations near the film/substrate interface. Subsequent annealing at 500 degrees C in air transformed the nanorods into polycrystalline triclinic/monoclinic WO(3) structure and the nanorod morphology was retained. Substoichiometric WO(3) films grown in an Ar/O(2) plasma at room temperature had an amorphous structure and also exhibited nanorod morphology. Post-deposition annealing at 500 degrees C in air induced crystallization to a polycrystalline triclinic/monoclinic WO(3) phase and also caused a morphological change from nanorods into a nanoporous network. (C) 2009 Elsevier B.V. All rights reserved.
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