期刊
THIN SOLID FILMS
卷 518, 期 22, 页码 6432-6436出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2010.03.059
关键词
Atomic layer deposition; ZrO2; Self-limiting reaction; UV-ALD; PET
A UV-enhanced atomic layer deposition (UV-ALD) process was developed to deposit ZrO2 thin films on poly (ethylene terephthalate) (PET) polymer substrates using zirconium tetra-tert-butoxide (ZTB) and H2O as precursors with UV light. In the UV-ALD process, the surface reactions were found to be self-limiting and complementary enough to yield uniform, conformal, and pure ZrO2 thin films on polymer substrates at room temperature. The UV light was very effective to obtain the high-quality ZrO2 thin films with good adhesive strength on polymer substrates. The ZrO2 thin films exhibit large-scale uniformity, sharp interfaces, and unique electrical properties. (C) 2010 Elsevier B.V. All rights reserved.
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