期刊
THIN SOLID FILMS
卷 517, 期 18, 页码 5409-5414出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2009.01.010
关键词
Radio-frequency plasma-enhanced chemical vapor deposition; Titanium dioxide; Thin films; Optical properties; Wetting; Structural properties; Morphology; Raman spectroscopy; Atomic force microscopy
类别
资金
- Polish Ministry of Scientific Research and Information Technology [3 T08E 10829]
Thin titanium oxide films were deposited using a radio frequency (RF) plasma enhanced chemical vapour deposition method. Their optical properties and thickness were determined by means of ultraviolet-visible absorption spectrophotometry. Films of the optical parameters very close to those of titanium dioxide have been obtained at the high RF power input. Their optical quality is high enough to allow for their use in a construction of stack interference optical filters. At the same time, these materials exhibit strong photocatalytic effects. The results of structural analysis, carried out by Raman Shift Spectroscopy, show that the coatings posses amorphous structure. However, Raman spectra of the same films subjected to thermal annealing at 450 degrees C disclose an appearance of a crystalline form, namely that of anatase. Surface morphology of the films has also been characterized by Atomic Force Microscopy revealing granular, broccoli-like topography of the films. 2009 Published by Elsevier B.V.
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