期刊
THIN SOLID FILMS
卷 518, 期 5, 页码 1430-1433出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2009.09.060
关键词
Reactive sputtering; XRD; FE-SEM
Tungsten oxide films were produced using reactive rf magnetron sputtering. In this work, nitrogen doping was used to modify structural and, optical properties of the material in the presence of two inert gases (argon and helium). Substituting helium gas with argon results in a decrease in the particle sizes and thus affects the band gap values. Bandgap values were obtained over the range of 2.43 to 3.01 eV via incorporating oxygen-nitrogen-argon/helium mixtures in the gas ambient. it was also observed that the atomic mass of the sputtering gas plays a major role for changing the primary crystallite size as well as the surface morphology and texture. (C) 2009 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据